Materials Science Program and WISELI Seminar

Professor Gila Stein, University of Houston. Polymer thin films are essential for patterning microelectronics circuitry with lithographic processes. Our work explores the physical and chemical processes that drive pattern formation in two material classes that are relevant to next-generation lithography. First, I will discuss reaction kinetics in chemically-amplified photoresists (CARs), where pattern formation is based on the acid-catalyzed deprotection of glassy polymer resins.