Materials Science and MRSEC Seminar

Black presents "Designing Nanostructured Materials with Block Copolymer Self Assembly." Block copolymer thin films provide a robust method for generating regular, uniform patterns at length scales in the range of ten nanometers, over arbitrarily large areas. A significant advantage of block copolymer-based patterning is its ease of integration with all other aspects of traditional thin-film processing, including plasma-based etching and metallization.