CDMC Conversation Series: Dakota Mace
Diné (Navajo) Photographer and Textile Artist
Event Details
Date
Wednesday, November 18, 2020
Time
1 p.m.
Location
Description
Join CDMC Visiting Executive Director Sarah Anne Carter in conversation with Diné (Navajo) artist and scholar, Dakota Mace. A graduate of the University of Wisconsin–Madison and the Institute of American Indian Arts, Mace is a photographer and textile artist. Her art and research focuses on appropriation of Indigenous design-work. Mace is currently a lecturer in photography at UW–Madison and the photographer for the CDMC.
Supported by The Anonymous Fund
Supported by The Anonymous Fund
Cost
Free
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